Over deze norm
1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.
1.2 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
|Nederlandse titel||Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer|
|Engelse titel||Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer|