Norm

ASTM F1238-95(2011)

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications

48,24

Over deze norm

Status Definitief
Aantal pagina's 3
Commissie F01.17
Gepubliceerd op 01-06-2011
Taal Engels

1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.

1.2 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.

Details

ICS-code 31.100
Nederlandse titel Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
Engelse titel Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications

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