Over deze norm
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).
1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
|Nederlandse titel||Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications|
|Engelse titel||Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications|