Norm

ASTM F1709-97(2016)

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

48,24

Over deze norm

Status Definitief
Aantal pagina's 3
Commissie F01.17
Gepubliceerd op 01-05-2016
Taal Engels

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

Details

ICS-code 31.120
Nederlandse titel Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
Engelse titel Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

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