Over deze norm
1.1 This test method covers the measurement of the sheet resistance of metallic thin films with a collinear four-probe array. It is intended for use with rectangular metallic films between 0.01 and 100 [mu]m thick, formed by deposition of a material or by a thinning process and supported by an insulating substrate, in the sheet resistance range from 10 to 10 [omega]/[open-box] (see 3.1.3).
1.2 This test method is suitable for referee measurement purposes as well as for routine acceptance measurements.
1.3 The values stated in Si units are to be regarded as the standard. The values given in parentheses are for information only.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
|Nederlandse titel||Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array|
|Engelse titel||Standard Test Method for Sheet Resistance of Thin Metallic Films With a Collinear Four-Probe Array|