Norm

IEC 62047-2:2006 en;fr

Halfgeleiders - Micro-elektromechanische toestellen - Deel 2: Trekproef van dunne filmmaterialen

41,55

Over deze norm

Status Definitief
Aantal pagina's 25
Commissie Halfgeleiders
Gepubliceerd op 01-08-2006
Taal Engels, Frans
This International Standard specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices. The main structural materials for MEMS, micromachines and similar devices have special features such as typical dimensions in the order of a few microns, a material fabrication by deposition, and a test piece fabrication by non-mechanical machining using etching and photolithography. This International Standard specifies the testing method, which enables a guarantee of accuracy corresponding to the special features.

Details

ICS-code 31.080.99
Nederlandse titel Halfgeleiders - Micro-elektromechanische toestellen - Deel 2: Trekproef van dunne filmmaterialen
Engelse titel Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin fil materials

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