Norm

NEN-EN-IEC 62047-26:2016 en

Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures

153,97

Over deze norm

Status Definitief
Aantal pagina's 57
Commissie Halfgeleiders
Gepubliceerd op 01-05-2016
Taal Engels
NEN-EN-IEC 62047-26 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 μm to 100 μm; walls and trenches with respective widths of 5 μm to 150 μm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 μm or larger, and with dimensions that fit inside a cube with sides of 100 μm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.

Details

ICS-code 31.080.99
Nederlandse titel Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures
Engelse titel Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures

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