Over deze norm
This International Standard provides the evaluation methods of thickness, density and interface width of single layer and multilayered thin films which have thicknesses between approximately 1 nm and 1 ?m, on flat substrates, by means of X-Ray Reflectometry (XRR). The method using a monochromated, collimated beam, and scanning either angle or scattering vector is described. Similar considerations apply to the case of a convergent beam with parallel data collection using a distributed detector or to scanning wavelength, but these methods are not described here. While mention is made of diffuse XRR, and the requirements for experiments are similar, this is not covered in the present document. Measurements may be made on equipment of various configurations, from laboratory instruments to reflectometers at synchrotron radiation beamlines or automated systems used in industry. Attention should be paid to an eventual instability of the layers over the duration of the data collection, which would cause a reduce accuracy of the measurement results. Since XRR, performed at a single wavelenght, does nor provide chemical information about the layers, much attention should be paid to possible contamination or reactions a the specimen surface. The accuracy of results fort he outmost layer is strongly influenced by any change at the surface.
|Nederlandse titel||Evaluatie van dikte, dichtheid en interfacebreedte van dunne films door X-ray reflectometrie - Instrumentale eisen, uitlijning en positionering, gegevensverzameling, gegevensanalyses en rapportage|
|Engelse titel||Evaluation of thickness, density and interface width of thin films by X-ray reflectometry - Instrumental requirements, alignment and positioning, data collection, data analysis and reporting|