Norm

NEN-ISO 4:2003 en

Meting van de thermische geleiding van dunne film op siliconen ondergronden

106,87 129,31 Incl BTW

Over deze norm

Status Definitief
Aantal pagina's 19
Commissie Lassen en verwante processen
Gepubliceerd op 01-03-2003
Taal Engels
A standard procedure for the three-omega method is proposed for measuring the thermal conductivity of a thin, electrically insulating film, on a substrate having a thermal conductivity significantly greater than the thermal conductivity of the film. This method is applicable to a film on a silicon substrate with the following characteristics: a) the film is electrically insulating; b) the film has a thermal conductivity that is less than one tenth the thermal conductivity of silicon; c) the film is uniform in thickness and the thickness lies in the range 0,25 µm to 1 µm; d) the maximum dimensions of the film are limited by the sizes of the preparation and measurement apparatus; e) the minimum dimensions of the film are limited by the minimum size of the circuit element that can be placed on the film surface.

Details

ICS-code 19.100
Nederlandse titel Meting van de thermische geleiding van dunne film op siliconen ondergronden
Engelse titel Measurement of thermal conductivity of thin films on silicon substrates

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