Norm

NPR-ISO/TR 22335:2007 en

Chemische analyse van oppervlakken - Diepteprofielen - Meten van de Mesh-replicamethode sproeiingssnelheid met gebruik van een mechanische tastprofilometer

79,70

Over deze norm

Status Definitief
Aantal pagina's 18
Commissie Lucht- en ruimtevaart
Gepubliceerd op 01-08-2007
Taal Engels
This Technical Report describes a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. This Technical Report is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputtering rate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputtering time. This Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depth profile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, a scanning probe microscope system. It is not applicable to the case where the sputtered area is less than 0,4 mm2 or where the sputter-induced surface roughness is significant compared with the sputtered depth to be measured.

Details

ICS-code 71.040.40
Nederlandse titel Chemische analyse van oppervlakken - Diepteprofielen - Meten van de Mesh-replicamethode sproeiingssnelheid met gebruik van een mechanische tastprofilometer
Engelse titel Surface chemical analysis - Depth profiling - Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer

Winkelwagen

Subtotaal:

Ga naar winkelwagen